검색결과 : 2건
| No. | Article |
|---|---|
| 1 |
Adsorption behavior of anionic polyelectrolyte for chemical mechanical polishing (CMP) Kim S, So JH, Lee DJ, Yang SM Journal of Colloid and Interface Science, 319(1), 48, 2008 |
| 2 |
Dependence of Nanotopography Impact on Fumed Silica and Ceria Slurry Added with Surfactant for Shallow Trench Isolation Chemical Mechanical Polishing Cho KC, Jeon H, Park JG Korean Journal of Materials Research, 16(5), 308, 2006 |