1 |
Improved process control, lowered costs and reduced risks through the use of non-destructive mobility and sheet carrier density measurements on GaAs and GaN wafers Nguyen D, Hogan K, Blew A, Cordes M Journal of Crystal Growth, 272(1-4), 59, 2004 |
2 |
Kinetic study of the OH plus isoprene and OH plus ethylene reactions between 2 and 6 torr and over the temperature range 300-423 K Chuong B, Stevens PS Journal of Physical Chemistry A, 104(22), 5230, 2000 |
3 |
Chemical reaction kinetics and reactor modeling of NOx removal in a pulsed streamer corona discharge reactor Sathiamoorthy G, Kalyana S, Finney WC, Clark RJ, Locke BR Industrial & Engineering Chemistry Research, 38(5), 1844, 1999 |
4 |
Product branching ratios of the HCO+NO2 reaction Rim KT, Hershberger JF Journal of Physical Chemistry A, 102(29), 5898, 1998 |
5 |
Diagnostics and kinetic modeling of a hollow cathode N2O discharge de los Arcos T, Domingo C, Herrero VJ, Sanz MM, Schulz A, Tanarro I Journal of Physical Chemistry A, 102(31), 6282, 1998 |
6 |
Dynamics of Oh and OD Radical Reactions with HI and GeH4 as Studied by Infrared Chemiluminescence of the H2O and HDO Products Butkovskaya NI, Setser DW Journal of Chemical Physics, 106(12), 5028, 1997 |
7 |
Modeling the Decomposition of Nitromethane, Induced by Shock Heating Zhang YX, Bauer SH Journal of Physical Chemistry B, 101(43), 8717, 1997 |
8 |
Modeling Chemical Downstream Etch Systems for NF3/O-2 Mixtures Meeks E, Larson RS, Vosen SR, Shon JW Journal of the Electrochemical Society, 144(1), 357, 1997 |
9 |
Influence of CF3I, CF3Br, and CF3H on the high-temperature combustion of methane Babushok V, Noto T, Burgess DRF, Hamins A, Tsang W Combustion and Flame, 107(4), 351, 1996 |
10 |
Chemical-Dynamics of H Abstraction by Oh Radicals - Vibrational-Excitation of H2O, Hod, and D2O Produced in Reactions of Oh and OD with HBr and DBR Butkovskaya NI, Setser DW Journal of Physical Chemistry, 100(12), 4853, 1996 |