검색결과 : 3건
| No. | Article |
|---|---|
| 1 |
Alternative developer solutions for extreme ultraviolet resist Itani T, Santillan JJ Journal of Vacuum Science & Technology B, 27(6), 2986, 2009 |
| 2 |
Latent image formation in chemically amplified extreme ultraviolet resists with low activation energy for deprotection reaction Kozawa T, Tagawa S, Santillan JJ, Itani T Journal of Vacuum Science & Technology B, 26(6), 2257, 2008 |
| 3 |
Image contrast slope and line edge roughness of chemically amplified resists for postoptical lithography Kozawa T, Tagawa S, Santillan JJ, Toriumi M, Itani T Journal of Vacuum Science & Technology B, 25(6), 2295, 2007 |