검색결과 : 10건
No. | Article |
---|---|
1 |
Massive Theoretical Screen of Hole Conducting Organic Materials in the Heteroacene Family by Using a Cloud-Computing Environment Matsuzawa NN, Arai H, Sasago M, Fujii E, Goldberg A, Mustard TJ, Kwak HS, Giesen DJ, Ranalli F, Halls MD Journal of Physical Chemistry A, 124(10), 1981, 2020 |
2 |
Machine-Learning Guided Quantum Chemical and Molecular Dynamics Calculations to Design Novel Hole-Conducting Organic Materials Antono E, Matsuzawa NN, Ling JL, Saal JE, Arai H, Sasago M, Fujii E Journal of Physical Chemistry A, 124(40), 8330, 2020 |
3 |
Synthesis of poly[N-(1-adamantyl)vinylsulfonamide-co-2-(2-methyl)adamantyl methacrylatel for 193 nm lithography Fukuhara T, Shibasaki Y, Ando S, Kishimura S, Endo M, Sasago M, Ueda M Macromolecules, 38(8), 3041, 2005 |
4 |
Study on beam size correction free from Coulomb interaction Takenaka H, Sasago M Journal of Vacuum Science & Technology B, 20(1), 138, 2002 |
5 |
Study of the resist deformation in nanoimprint lithography Hirai Y, Fujiwara M, Okuno T, Tanaka Y, Endo M, Irie S, Nakagawa K, Sasago M Journal of Vacuum Science & Technology B, 19(6), 2811, 2001 |
6 |
Reduction of line edge roughness in the top surface imaging process Mori S, Morisawa T, Matsuzawa N, Kaimoto Y, Endo M, Matsuo T, Kuhara K, Sasago M Journal of Vacuum Science & Technology B, 16(6), 3739, 1998 |
7 |
Pattern collapse in the top surface imaging process after dry development Mori S, Morisawa T, Matsuzawa N, Kaimoto Y, Endo M, Matsuo T, Kuhara K, Sasago M Journal of Vacuum Science & Technology B, 16(6), 3744, 1998 |
8 |
Prospect and Challenges of ArF Excimer-Laser Lithography Processes and Materials Ohfuji T, Ogawa T, Kuhara K, Sasago M Journal of Vacuum Science & Technology B, 14(6), 4203, 1996 |
9 |
New Chemically Amplified Positive Resist for Electron-Beam Lithography Hashimoto K, Katsuyama A, Endo M, Sasago M Journal of Vacuum Science & Technology B, 12(1), 37, 1994 |
10 |
Performance of 0.2 Mu-M Optical Lithography Using KrF and ArF Excimer-Laser Sources Yamashita K, Endo M, Sasago M, Nomura N, Nagano H, Mizuguchi S, Ono T, Sato T Journal of Vacuum Science & Technology B, 11(6), 2692, 1993 |