화학공학소재연구정보센터
검색결과 : 4건
No. Article
1 Neutral gas temperature measurements within transformer coupled toroidal argon plasmas
Bai B, Sawin H
Journal of Vacuum Science & Technology A, 22(5), 2014, 2004
2 Evaluation of octafluorocyclobutane as a chamber clean gas in a plasma-enhanced silicon dioxide chemical vapor deposition reactor
Allgood C, Mocella M, Chae HY, Sawin H
Journal of the Electrochemical Society, 150(2), G122, 2003
3 Thermal decomposition of low dielectric constant pulsed plasma fluorocarbon films - I. Effect of precursors and substrate temperature
Cruden B, Chu K, Gleason K, Sawin H
Journal of the Electrochemical Society, 146(12), 4590, 1999
4 Thermal decomposition of low dielectric constant pulsed plasma fluorocarbon films - II. Effect of postdeposition annealing and ambients
Cruden B, Chu K, Gleason K, Sawin H
Journal of the Electrochemical Society, 146(12), 4597, 1999