검색결과 : 1건
| No. | Article |
|---|---|
| 1 |
Resolution limit of negative tone chemically amplified resist used for hybrid lithography: Influence of the molecular weight Pain L, Higgins C, Scarfogliere B, Tedesco S, Dal'Zotto B, Gourgon C, Ribeiro M, Kusumoto T, Suetsugu M, Hanawa R Journal of Vacuum Science & Technology B, 18(6), 3388, 2000 |