검색결과 : 16건
| No. | Article |
|---|---|
| 1 |
Transparent hybrid inorganic/organic barrier coatings for plastic organic light-emitting diode substrates Kim TW, Yan M, Erlat G, McConnelee PA, Pellow M, Deluca J, Feist TP, Duggal AR, Schaepkens M Journal of Vacuum Science & Technology A, 23(4), 971, 2005 |
| 2 |
Ultrahigh barrier coating deposition on polycarbonate substrates Schaepkens M, Kim TW, Erlat AG, Yan M, Flanagan KW, Heller CM, McConnelee PA Journal of Vacuum Science & Technology A, 22(4), 1716, 2004 |
| 3 |
High-rate deposition of abrasion resistant coatings using a dual-source expanding thermal plasma reactor Schaepkens M, Selezneva S, Moeleker P, Iacovangelo CD Journal of Vacuum Science & Technology A, 21(4), 1266, 2003 |
| 4 |
Spatially resolved mass spectrometric sampling of inductively coupled plasmas using a movable sampling orifice Li X, Oehrlein GS, Schaepkens M, Ellefson RE, Frees LC Journal of Vacuum Science & Technology A, 21(6), 1971, 2003 |
| 5 |
Stripping of photoresist using a remote thermal Ar/O-2 and Ar/N-2/O-2 plasma Brussaard GJH, Letourneur KGY, Schaepkens M, van de Sanden MCM, Schram DC Journal of Vacuum Science & Technology B, 21(1), 61, 2003 |
| 6 |
A review of SiO2 etching studies in inductively coupled fluorocarbon plasmas Schaepkens M, Oehrlein GS Journal of the Electrochemical Society, 148(3), C211, 2001 |
| 7 |
Gas-phase studies in inductively coupled fluorocarbon plasmas Schaepkens M, Martini I, Sanjuan EA, Li X, Oehrlein GS, Perry WL, Anderson HM Journal of Vacuum Science & Technology A, 19(6), 2946, 2001 |
| 8 |
Effect of radio frequency bias power on SiO2 feature etching in inductively coupled fluorocarbon plasmas Schaepkens M, Oehrlein GS, Cook JM Journal of Vacuum Science & Technology B, 18(2), 848, 2000 |
| 9 |
Study of the SiO2-to-Si3N4 etch selectivity mechanism in inductively coupled fluorocarbon plasmas and a comparison with the SiO2-to-Si mechanism Schaepkens M, Standaert TEFM, Rueger NR, Sebel PGM, Oehrlein GS, Cook JM Journal of Vacuum Science & Technology A, 17(1), 26, 1999 |
| 10 |
Mass spectrometric measurements on inductively coupled fluorocarbon plasmas: Positive ions, radicals and endpoint detection Li X, Schaepkens M, Oehrlein GS, Ellefson RE, Frees LC, Mueller N, Korner N Journal of Vacuum Science & Technology A, 17(5), 2438, 1999 |