검색결과 : 1건
| No. | Article |
|---|---|
| 1 |
Effects of radio frequency bias frequency and radio frequency bias pulsing on SiO2 feature etching in inductively coupled fluorocarbon plasmas Schaepkens N, Oehrlein GS, Cook JM Journal of Vacuum Science & Technology B, 18(2), 856, 2000 |