검색결과 : 7건
No. | Article |
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1 |
Fundamental properties of a-SiNx: H thin films deposited by ICP-PECVD for MEMS applications Dergez D, Schalko J, Bittner A, Schmid U Applied Surface Science, 284, 348, 2013 |
2 |
An elevated temperature study of a Ti adhesion layer on polyimide Taylor AA, Cordill MJ, Bowles L, Schalko J, Dehm G Thin Solid Films, 531, 354, 2013 |
3 |
On the stacking behavior of functionalized single-wall carbon nanotubes Kukovecz A, Kramberger C, Holzinger M, Kuzmany H, Schalko J, Mannsberger M, Hirsch A Journal of Physical Chemistry B, 106(25), 6374, 2002 |
4 |
Correlation Between Gas-Phase Composition of RF Plasma of Argon Diluted Tetraethylgermanium and Chemical-Structure of Therewith Deposited Ge/C Films Gazicki M, Szymanowski H, Tyczkowski J, Schalko J, Olcaytug F Journal of Vacuum Science & Technology A, 14(5), 2835, 1996 |
5 |
Chemical Bonding in Thin Ge/C Films Deposited from Tetraethylgermanium in an RF Glow-Discharge - An FTIR Study Gazicki M, Szymanowski H, Tyczkowski J, Malinovsky L, Schalko J, Fallmann W Thin Solid Films, 256(1-2), 31, 1995 |
6 |
C-13 Nuclear-Magnetic-Resonance Signals of Ge/C Films Deposited from Tetraethylgermanium in an RF Glow-Discharge Gazicki M, Potrzebowski MJ, Tyczkowski J, Schalko J Thin Solid Films, 258(1-2), 10, 1995 |
7 |
Study on Electromagnetron for Plasma Polymerization .2. Magnetic-Field Enhanced Radio-Frequency Plasma Deposition of Organogermanium Films from Tetraethylgermanium Gazicki M, Schalko J, Olcaytug F, Ebel M, Ebel H, Wernisch J, Yasuda H Journal of Vacuum Science & Technology A, 12(2), 345, 1994 |