화학공학소재연구정보센터
검색결과 : 22건
No. Article
1 Formation of block-copolymer-templated mesoporous silica
Bjork EM, Makie P, Rogstrom L, Atakan A, Schell N, Oder M
Journal of Colloid and Interface Science, 521, 183, 2018
2 Formation of a quasicrystalline phase in Al-Mn base alloys cast at intermediate cooling rates
Stan-Glowinska K, Rogal L, Goral A, Wierzbicka-Miernik A, Wojewoda-Budka J, Schell N, Litynska-Dobrzynska L
Journal of Materials Science, 52(13), 7794, 2017
3 Phase transformation kinetics during continuous heating of a beta-quenched Ti-10V-2Fe-3Al alloy
Barriobero-Vila P, Requena G, Warchomicka F, Stark A, Schell N, Buslaps T
Journal of Materials Science, 50(3), 1412, 2015
4 Thermal stability of epitaxial cubic-TiN/(Al,Sc)N metal/semiconductor superlattices
Schroeder JL, Saha B, Garbrecht M, Schell N, Sands TD, Birch J
Journal of Materials Science, 50(8), 3200, 2015
5 Influence of rare-earth addition on the long-period stacking ordered phase in cast Mg-Y-Zn alloys
Garces G, Requena G, Tolnai D, Perez P, Adeva P, Stark A, Schell N
Journal of Materials Science, 49(7), 2714, 2014
6 Texture development, microstructure and phase transformation characteristics of sputtered Ni-Ti Shape Memory Alloy films grown on TiN < 111 >
Martins RMS, Schell N, Reuther H, Pereira L, Mahesh KK, Silva RJC, Fernandes FMB
Thin Solid Films, 519(1), 122, 2010
7 Corrigendum to "Nickel assisted metal induced crystallization of silicon: Effect of native silicon oxide layer"
Pereira L, Martins RMS, Schell N, Fortunato E, Martins R
Thin Solid Films, 516(1), 104, 2007
8 In-situ observation of Ni-Ti thin film growth by synchrotron radiation scattering
Martins RMS, Fernandes FMB, Silva RJC, Beckers M, Schell N
Materials Science Forum, 514-516, 1588, 2006
9 Nickel-assisted metal-induced crystallization of silicon: Effect of native silicon oxide layer
Pereira L, Martins RMS, Schell N, Fortunato E, Martins R
Thin Solid Films, 511, 275, 2006
10 In situ x-ray diffraction studies concerning the influence of Al concentration on the texture development during sputter deposition of Ti-Al-N thin films
Beckers M, Schell N, Martins RMS, Mucklich A, Moller W
Journal of Vacuum Science & Technology A, 23(5), 1384, 2005