화학공학소재연구정보센터
검색결과 : 3건
No. Article
1 Enhancement of semiconductor wafer cleaning by chelating agent addition
Gale GW, Rath DL, Cooper EI, Estes S, Okorn-Schmidt HF, Brigante J, Jagannathan R, Settembre G, Adams E
Journal of the Electrochemical Society, 148(9), G513, 2001
2 Impact of the Electrochemical Properties of Silicon-Wafer Surfaces on Copper Outplating from HF Solutions
Teerlinck I, Mertens PW, Schmidt HF, Meuris M, Heyns MM
Journal of the Electrochemical Society, 143(10), 3323, 1996
3 Sensitive Light-Scattering as a Semiquantitative Method for Studying Photoresist Stripping
Rotondaro AL, Meuris M, Schmidt HF, Heyns MM, Claeys C, Hellemans L, Snauwaert J
Journal of the Electrochemical Society, 142(1), 211, 1995