검색결과 : 25건
| No. | Article |
|---|---|
| 1 |
On the Possibilities of Straightforward Characterization of Plasma Activated Water Hoeben WFLM, van Ooij PP, Schram DC, Huiskamp T, Pemen AJM, Lukes P Plasma Chemistry and Plasma Processing, 39(3), 597, 2019 |
| 2 |
Evidence of Lyman transitions of high rovibrationally excited HD and D-2 detected by laser induced fluorescence in the VUV Gabriel O, van den Dungen JJA, Soliman WM, Schram DC, Engeln R Chemical Physics Letters, 451(4-6), 204, 2008 |
| 3 |
Production mechanisms of NH and NH2 radicals in N-2-H-2 plasmas van Helden JH, van den Oever PJ, Kessels WMM, de Sanden MCMV, Schram DC, Engeln R Journal of Physical Chemistry A, 111(45), 11460, 2007 |
| 4 |
Detailed TIMS study of Ar/C2H2 expanding thermal plasma: identification of a-C : H film growth precursors Benedikt J, Schram DC, van de Sanden MCM Journal of Physical Chemistry A, 109(44), 10153, 2005 |
| 5 |
High rotational excitation of molecular hydrogen in plasmas Vankan P, Schram DC, Engeln R Chemical Physics Letters, 400(1-3), 196, 2004 |
| 6 |
Phase-shift cavity ring-down spectroscopy to determine absolute line intensities van Helden JH, Schram DC, Engeln R Chemical Physics Letters, 400(4-6), 320, 2004 |
| 7 |
Relaxation behavior of rovibrationally excited H-2 in a rarefied expansion Vankan P, Schram DC, Engeln R Journal of Chemical Physics, 121(20), 9876, 2004 |
| 8 |
Plasma diagnostic study of silicon nitride film growth in a remote Ar-H-2-N2-SiH4 plasma: Role of N and SiHn radicals Kessels WMM, van Assche FJH, Hong J, Schram DC, van de Sanden MCM Journal of Vacuum Science & Technology A, 22(1), 96, 2004 |
| 9 |
Argon-oxygen plasma treatment of deposited organosilicon thin films van Hest MFAM, Klaver A, Schram DC, van de Sanden MCM Thin Solid Films, 449(1-2), 40, 2004 |
| 10 |
Deposition of organosilicon thin films using a remote thermal plasma van Hest MFAM, Mitu B, Schram DC, van de Sanden MCM Thin Solid Films, 449(1-2), 52, 2004 |