검색결과 : 19건
No. | Article |
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1 |
A human tissue screen identifies a regulator of ER secretion as a brain-size determinant Esk C, Lindenhofer D, Haendeler S, Wester RA, Pflug F, Schroeder B, Bagley JA, Elling U, Zuber J, von Haeseler A, Knoblich JA Science, 370(6519), 935, 2020 |
2 |
High-Performance Ambipolar Diketopyrrolopyrrole-Thieno[3,2-b]thiophene Copolymer Field-Effect Transistors with Balanced Hole and Electron Mobilities Chen ZY, Lee MJ, Ashraf RS, Gu Y, Albert-Seifried S, Nielsen MM, Schroeder B, Anthopoulos TD, Heeney M, McCulloch I, Sirringhaus H Advanced Materials, 24(5), 647, 2012 |
3 |
Molecular Packing of High-Mobility Diketo Pyrrolo-Pyrrole Polymer Semiconductors with Branched Alkyl Side Chains Zhang XR, Richter LJ, DeLongchamp DM, Kline RJ, Hammond MR, McCulloch I, Heeney M, Ashraf RS, Smith JN, Anthopoulos TD, Schroeder B, Geerts YH, Fischer DA, Toney MF Journal of the American Chemical Society, 133(38), 15073, 2011 |
4 |
Hydrogen etching of Si3N4 layers with plasma assisted hot wire CVD Kniffler N, Pflueger A, Schulz T, Sommer S, Schroeder B Thin Solid Films, 519(14), 4582, 2011 |
5 |
Problem of catalyst ageing during the hot-wire chemical vapour deposition of thin silicon films Hrunski D, Scheib M, Mertz M, Schroeder B Thin Solid Films, 517(11), 3370, 2009 |
6 |
Degradation and silicidation of Ta- and W-filaments for different filament temperatures Kniffler N, Pflueger A, Scheller D, Schroeder B Thin Solid Films, 517(12), 3424, 2009 |
7 |
Electrical properties/Doping efficiency of doped microcrystalline silicon layers prepared by hot-wire chemical vapor deposition Kumar P, Schroeder B Thin Solid Films, 516(5), 580, 2008 |
8 |
Recent contributions of the Kaiserslautern research group to thin silicon solar cell R&D applying the HW(Cat)CVD Schroeder B, Kupich M, Kumar P, Grunsky D Thin Solid Films, 516(5), 722, 2008 |
9 |
Hot Ta filament resistance in-situ monitoring under silane containing atmosphere Grunsk D, Schroeder B Thin Solid Films, 516(5), 814, 2008 |
10 |
Investigation of silicon contamination of Ta filaments used for thin film silicon deposition Grunski D, Schroeder B, Scheib M, Merz RM, Bock W, Wagner C Thin Solid Films, 516(5), 818, 2008 |