화학공학소재연구정보센터
검색결과 : 19건
No. Article
1 A human tissue screen identifies a regulator of ER secretion as a brain-size determinant
Esk C, Lindenhofer D, Haendeler S, Wester RA, Pflug F, Schroeder B, Bagley JA, Elling U, Zuber J, von Haeseler A, Knoblich JA
Science, 370(6519), 935, 2020
2 High-Performance Ambipolar Diketopyrrolopyrrole-Thieno[3,2-b]thiophene Copolymer Field-Effect Transistors with Balanced Hole and Electron Mobilities
Chen ZY, Lee MJ, Ashraf RS, Gu Y, Albert-Seifried S, Nielsen MM, Schroeder B, Anthopoulos TD, Heeney M, McCulloch I, Sirringhaus H
Advanced Materials, 24(5), 647, 2012
3 Molecular Packing of High-Mobility Diketo Pyrrolo-Pyrrole Polymer Semiconductors with Branched Alkyl Side Chains
Zhang XR, Richter LJ, DeLongchamp DM, Kline RJ, Hammond MR, McCulloch I, Heeney M, Ashraf RS, Smith JN, Anthopoulos TD, Schroeder B, Geerts YH, Fischer DA, Toney MF
Journal of the American Chemical Society, 133(38), 15073, 2011
4 Hydrogen etching of Si3N4 layers with plasma assisted hot wire CVD
Kniffler N, Pflueger A, Schulz T, Sommer S, Schroeder B
Thin Solid Films, 519(14), 4582, 2011
5 Problem of catalyst ageing during the hot-wire chemical vapour deposition of thin silicon films
Hrunski D, Scheib M, Mertz M, Schroeder B
Thin Solid Films, 517(11), 3370, 2009
6 Degradation and silicidation of Ta- and W-filaments for different filament temperatures
Kniffler N, Pflueger A, Scheller D, Schroeder B
Thin Solid Films, 517(12), 3424, 2009
7 Electrical properties/Doping efficiency of doped microcrystalline silicon layers prepared by hot-wire chemical vapor deposition
Kumar P, Schroeder B
Thin Solid Films, 516(5), 580, 2008
8 Recent contributions of the Kaiserslautern research group to thin silicon solar cell R&D applying the HW(Cat)CVD
Schroeder B, Kupich M, Kumar P, Grunsky D
Thin Solid Films, 516(5), 722, 2008
9 Hot Ta filament resistance in-situ monitoring under silane containing atmosphere
Grunsk D, Schroeder B
Thin Solid Films, 516(5), 814, 2008
10 Investigation of silicon contamination of Ta filaments used for thin film silicon deposition
Grunski D, Schroeder B, Scheib M, Merz RM, Bock W, Wagner C
Thin Solid Films, 516(5), 818, 2008