검색결과 : 3건
| No. | Article |
|---|---|
| 1 |
Liquid immersion lithography: Why, how, and when? Rothschild M, Bloomstein TM, Kunz RR, Liberman V, Switkes M, Palmacci ST, Sedlacek JHC, Hardy D, Grenville A Journal of Vacuum Science & Technology B, 22(6), 2877, 2004 |
| 2 |
157 nm: Deepest deep-ultraviolet yet Rothschild M, Bloomstein TM, Curtin JE, Downs DK, Fedynyshyn TH, Hardy DE, Kunz RR, Liberman V, Sedlacek JHC, Uttaro RS, Bates AK, Van Peski C Journal of Vacuum Science & Technology B, 17(6), 3262, 1999 |
| 3 |
Materials issues for optical components and photomasks in 157 nm lithography Liberman V, Bloomstein TM, Rothschild M, Sedlacek JHC, Uttaro RS, Bates AK, Van Peski C, Orvek K Journal of Vacuum Science & Technology B, 17(6), 3273, 1999 |