화학공학소재연구정보센터
검색결과 : 2건
No. Article
1 Phenomenological model of reactive r.f.-magnetron sputtering of Si in Ar/O-2 atmosphere for the prediction of SiOx thin film stoichiometry from process parameters
Seifarth H, Schmidt JU, Grotzschel R, Klimenkov M
Thin Solid Films, 389(1-2), 108, 2001
2 Preparation of SiO2 films with embedded Si nanocrystals by reactive rf magnetron sputtering
Seifarth H, Grotzschel R, Markwitz A, Matz W, Nitzsche P, Rebohle L
Thin Solid Films, 330(2), 202, 1998