검색결과 : 2건
No. | Article |
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1 |
Phenomenological model of reactive r.f.-magnetron sputtering of Si in Ar/O-2 atmosphere for the prediction of SiOx thin film stoichiometry from process parameters Seifarth H, Schmidt JU, Grotzschel R, Klimenkov M Thin Solid Films, 389(1-2), 108, 2001 |
2 |
Preparation of SiO2 films with embedded Si nanocrystals by reactive rf magnetron sputtering Seifarth H, Grotzschel R, Markwitz A, Matz W, Nitzsche P, Rebohle L Thin Solid Films, 330(2), 202, 1998 |