검색결과 : 6건
| No. | Article |
|---|---|
| 1 |
Reaction chemistry in the afterglow of an oxygen-helium, atmospheric-pressure plasma Jeong JY, Park J, Henins I, Babayan SE, Tu VJ, Selwyn GS, Ding G, Hicks RF Journal of Physical Chemistry A, 104(34), 8027, 2000 |
| 2 |
Tantalum etching with a nonthermal atmospheric-pressure plasma Tu VJ, Jeong JY, Schutze A, Babayan SE, Ding G, Selwyn GS, Hicks RF Journal of Vacuum Science & Technology A, 18(6), 2799, 2000 |
| 3 |
Etching polyimide with a nonequilibrium atmospheric-pressure plasma jet Jeong JY, Babayan SE, Schutze A, Tu VJ, Park J, Henins I, Selwyn GS, Hicks RF Journal of Vacuum Science & Technology A, 17(5), 2581, 1999 |
| 4 |
In-situ analysis of particle contamination in magnetron sputtering processes Selwyn GS, Weiss CA, Sequeda F, Huang C Thin Solid Films, 317(1-2), 85, 1998 |
| 5 |
Particle Contamination Formation in Magnetron Sputtering Processes Selwyn GS, Weiss CA, Sequeda F, Huang C Journal of Vacuum Science & Technology A, 15(4), 2023, 1997 |
| 6 |
Particle Contamination Characterization in a Helicon Plasma-Etching Tool Selwyn GS, Bailey AD Journal of Vacuum Science & Technology A, 14(2), 649, 1996 |