검색결과 : 6건
| No. | Article |
|---|---|
| 1 |
Using Ni masks in inductively coupled plasma etching of high density hole patterns in GaN Hsu DSY, Kim CS, Eddy CR, Holm RT, Henry RL, Casey JA, Shamamian VA, Rosenberg A Journal of Vacuum Science & Technology B, 23(4), 1611, 2005 |
| 2 |
Measurements of neutral plasma species in an argon/isopropyl alcohol plasma for the deposition of organic films Guerin DC, Fernsler RF, Shamamian VA Journal of Vacuum Science & Technology A, 21(5), 1724, 2003 |
| 3 |
Plasma polymerization of thin films: Correlations between plasma chemistry and thin film character Guerin DC, Hinshelwood DD, Monolache S, Denes FS, Shamamian VA Langmuir, 18(10), 4118, 2002 |
| 4 |
Characterization of Cl-2/Ar high density plasmas for semiconductor etching Eddy CR, Leonhardt D, Douglass SR, Thoms BD, Shamamian VA, Butler JE Journal of Vacuum Science & Technology A, 17(1), 38, 1999 |
| 5 |
Characterization of high density CH4/H-2/Ar plasmas for compound semiconductor etching Eddy CR, Leonhardt D, Douglass SR, Shamamian VA, Thoms BD, Butler JE Journal of Vacuum Science & Technology A, 17(3), 780, 1999 |
| 6 |
Surface chemistry and damage in the high density plasma etching of gallium arsenide Leonhardt D, Eddy CR, Shamamian VA, Holm RT, Glembocki OJ, Butler JE Journal of Vacuum Science & Technology A, 16(3), 1547, 1998 |