화학공학소재연구정보센터
검색결과 : 3건
No. Article
1 Electric Field Accelerating Interface Diffusion in Cu/Ru/TaN/Si Stacks during Annealing
Wang L, Cao ZH, Syed JA, Hu K, She QW, Meng XK
Electrochemical and Solid State Letters, 15(6), H188, 2012
2 Improved diffusion barrier performance of Ru/TaN bilayer by N effusion in TaN underlayer
Wang L, Cao ZH, Hu K, She QW, Meng XK
Materials Chemistry and Physics, 135(2-3), 806, 2012
3 Effects of electric field annealing on the interface diffusion of Cu/Ta/Si stacks
Wang L, Cao ZH, Hu K, She QW, Meng XK
Applied Surface Science, 257(24), 10845, 2011