화학공학소재연구정보센터
검색결과 : 3건
No. Article
1 Effect of high-frequency on etching of SiCOH films in CHF3 dual-frequency capacitively coupled plasmas
Ye C, Xu YJ, Huang XJ, Ning ZY
Thin Solid Films, 518(12), 3223, 2010
2 Plasma ash processing solutions for advanced interconnect technology
Fuller NCM, Worsley MA, Tai L, Bent S, Labelle C, Arnold J, Dalton T
Thin Solid Films, 516(11), 3558, 2008
3 Effect of Si-OH group on characteristics of SiCOH films prepared by decamethylcyclopentasiloxane electron cyclotron resonance plasma
Ye C, Ning ZY, Wang TT, Yu XZ, Xin Y
Thin Solid Films, 496(2), 221, 2006