화학공학소재연구정보센터
검색결과 : 22건
No. Article
1 Impact of substrate material and annealing conditions on the microstructure and chemistry of yttria-stabilized-zirconia thin films
Scherrer B, Rossi A, Martynczuk J, Rossell MD, Bieberle-Hutter A, Rupp JLM, Erni R, Gauckler LJ
Journal of Power Sources, 196(18), 7372, 2011
2 An Improved Model for Boron Diffusion and Activation in Silicon
Kwok CTM, Braatz RD, Paul S, Lerch W, Seebauer EG
AIChE Journal, 56(2), 515, 2010
3 Reversibility of silicidation of Ta filaments in HWCVD of thin film silicon
van der Werf CHM, Li H, Verlaan V, Oliphant CJ, Bakker R, Houweling ZS, Schropp REI
Thin Solid Films, 517(12), 3431, 2009
4 Nitridation and oxynitridation of Si to control interfacial reaction with HfO2
Katarnreddy R, Inman R, Jursich G, Soulet A, Takoudis C
Thin Solid Films, 516(23), 8498, 2008
5 A screen-printed interdigitated back contact cell using a boron-source diffusion barrier
Hacke P, Gee JM
Solar Energy Materials and Solar Cells, 88(1), 119, 2005
6 Boron-carbide barrier layers in scandium-silicon multilayers
Jankowski AF, Saw CK, Walton CC, Hayes JP, Nilsen J
Thin Solid Films, 469-470, 372, 2004
7 Diffusion and evolution of hydrogen in hydrogenated amorphous and microcrystalline silicon
Beyer W
Solar Energy Materials and Solar Cells, 78(1-4), 235, 2003
8 Polycrystalline silicon prepared by metal induced crystallization
Choi JH, Kim DY, Kim SS, Park SJ, Jang J
Thin Solid Films, 440(1-2), 1, 2003
9 Solid-state graphitization mechanisms of silicon carbide 6H-SiC polar faces
Forbeaux I, Themlin JM, Charrier A, Thibaudau F, Debever JM
Applied Surface Science, 162, 406, 2000
10 Secondary defects engineering in c-Si: Influence of implantation dose, temperature, and oxygen concentration
Poirier R, Schiettekatte F, Roorda S, Fortin MO
Journal of Vacuum Science & Technology A, 18(2), 717, 2000