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| No. | Article |
|---|---|
| 1 |
Mass-Spectrometric and Kinetic-Study of Low-Pressure Chemical-Vapor-Deposition of Si3N4 Thin-Films from Sih2Cl2 and NH3 Sorita T, Satake T, Adachi H, Ogata T, Kobayashi K Journal of the Electrochemical Society, 141(12), 3505, 1994 |