검색결과 : 10건
| No. | Article |
|---|---|
| 1 |
Growth and characterization of silicon carbide thin films on silicon using a hollow cathode pulse sputtering technique Huguenin-Love J, Soukup RJ, Lanno NJ, Lauer NT Thin Solid Films, 520(7), 2395, 2012 |
| 2 |
Formation of CuIn1-xAlxSe2 thin films studied by Raman scattering Olejnicek J, Kamler CA, Darveau SA, Exstrom CL, Slaymaker LE, Vandeventer AR, Ianno NJ, Soukup RJ Thin Solid Films, 519(16), 5329, 2011 |
| 3 |
A non-vacuum process for preparing nanocrystalline CuIn1-xGaxSe2 materials involving an open-air solvothermal reaction Olejnicek J, Kamler CA, Mirasano A, Martinez-Skinner AL, Ingersoll MA, Exstrom CL, Darveau SA, Huguenin-Love JL, Diaz M, Ianno NJ, Soukup RJ Solar Energy Materials and Solar Cells, 94(1), 8, 2010 |
| 4 |
Thin films formed by selenization of CuInxB1-x precursors in Se vapor Kamler CA, Soukup RJ, Ianno NJ, Huguenin-Love JL, Olejnicek J, Darveau SA, Exstrom CL Solar Energy Materials and Solar Cells, 93(1), 45, 2009 |
| 5 |
Experimental studies of Ge1-xCx and Ge1-x-yCxAly thin films Soukup RJ, Huguenin-Love JL, Ianno NJ, Thompson DW Journal of Vacuum Science & Technology A, 26(1), 17, 2008 |
| 6 |
Analysis of semiconductor thin films deposited using a hollow cathode plasma torch Soukup RJ, Ianno NJ, Huguenin-Love JL Solar Energy Materials and Solar Cells, 91(15-16), 1383, 2007 |
| 7 |
Thin films of GeC deposited using a unique hollow cathode sputtering technique Schrader JS, Huguenin-Love JL, Soukup RJ, Ianno NJ, Exstrom CL, Darveau SA, Udey RN, Dalal VL Solar Energy Materials and Solar Cells, 90(15), 2338, 2006 |
| 8 |
Thin films of a-SiGe : H with device quality properties prepared by a novel hollow cathode deposition technique Soukup RJ, Ianno NJ, Darveau SA, Exstrom CL Solar Energy Materials and Solar Cells, 87(1-4), 87, 2005 |
| 9 |
Deposition of electronic quality amorphous silicon, a-Si : H, thin films by a hollow cathode plasma-jet reactive sputtering system Pribil G, Hubicka Z, Soukup RJ, Ianno NJ Journal of Vacuum Science & Technology A, 19(4), 1571, 2001 |
| 10 |
Quality hydrogenated amorphous silicon deposited by triode assisted reactive sputtering Konz DW, Soukup RJ Solar Energy Materials and Solar Cells, 56(2), 175, 1999 |