화학공학소재연구정보센터
검색결과 : 11건
No. Article
1 50th Anniversary: Filtration Society continues to play important industry role
Holmes M, Sparks T
Filtration & Separation, 50(4), 14, 2013
2 Solid-liquid filtration: Understanding filter presses and belt filters
Sparks T
Filtration & Separation, 49(4), 20, 2012
3 Alumina: Filtration in the alumina production process
Sparks T
Filtration & Separation, 47(3), 20, 2010
4 The use of unsaturated fluorocarbons for dielectric etch applications
Chatterjee R, Karecki S, Reif R, Vartanian V, Sparks T
Journal of the Electrochemical Society, 149(4), G276, 2002
5 Evaluation of oxalyl fluoride for a dielectric etch application in an inductively coupled plasma etch tool
Karecki S, Chatterjee R, Pruette L, Reif R, Sparks T, Beu L, Vartanian V, Novoselov M
Journal of the Electrochemical Society, 148(3), G141, 2001
6 The evaluation of hexafluorobenzene as an environmentally benign dielectric etch chemistry
Chatterjee R, Karecki S, Reif R, Sparks T, Vartanian V, Goolsby B
Journal of the Electrochemical Society, 148(12), G721, 2001
7 Characterization of iodoheptafluoropropane as a dielectric etchant. I. Process performance evaluation
Karecki S, Chatterjee R, Pruette L, Reif R, Vartanian V, Sparks T, Beu L, Novoselov K
Journal of Vacuum Science & Technology B, 19(4), 1269, 2001
8 Characterization of iodoheptafluoropropane as a dielectric etchant. II. Wafer surface analysis
Karecki S, Chatterjee R, Pruette L, Reif R, Vartanian V, Sparks T, Lee JJ, Beu L, Miller C
Journal of Vacuum Science & Technology B, 19(4), 1293, 2001
9 Characterization of iodoheptafluoropropane as a dielectric etchant. III. Effluent analysis
Karecki S, Chatterjee R, Pruette L, Reif R, Vartanian V, Sparks T, Beu L
Journal of Vacuum Science & Technology B, 19(4), 1306, 2001
10 High density plasma oxide etching using nitrogen trifluoride and acetylene
Pruette L, Karecki S, Chatterjee R, Reif R, Sparks T, Vartanian V
Journal of Vacuum Science & Technology A, 18(6), 2749, 2000