화학공학소재연구정보센터
검색결과 : 31건
No. Article
1 Water Corrodes Copper
Hultquist G, Szakalos P, Graham MJ, Belonoshko AB, Sproule GI, Grasjo L, Dorogokupets P, Danilov B, AAstrup T, Wikmark G, Chuah GK, Eriksson JC, Rosengren A
Catalysis Letters, 132(3-4), 311, 2009
2 The effect of surface cleaning on current collapse in AlGaN/GaN HEMTs
Bardwell JA, Haffouz S, McKinnon WR, Storey C, Tang H, Sproule GI, Roth D, Wang R
Electrochemical and Solid State Letters, 10(2), H46, 2007
3 Transport properties of yttrium-doped zirconia - Influence of kinetic demixing
Rizea A, Petot-Ervas G, Petot C, Abrudeanu M, Graham MJ, Sproule GI
Solid State Ionics, 177(39-40), 3417, 2007
4 Molecular beam epitaxy growth of 1.55 mu m GaInNAs(Sb) double quantum wells with bright and narrow photoluminescence
Gupta JA, Sproule GI, Wu X, Wasilewski ZR
Journal of Crystal Growth, 291(1), 86, 2006
5 Effects of O-2 dissociation on a porous platinum coating in the thermal oxidation of GaAs
Hultquist G, Graham MJ, Wee ATS, Liu R, Sproule GI, Dong Q, Anghel C
Journal of the Electrochemical Society, 153(2), G182, 2006
6 Raman and transmission electron microscopy study of disordered silicon grown by molecular beam epitaxy
Tay L, Lockwood DJ, Baribeau JM, Wu X, Sproule GI
Journal of Vacuum Science & Technology A, 22(3), 943, 2004
7 Low-temperature Si growth on Si (001): Impurity incorporation and limiting thickness for epitaxy
Baribeau JM, Wu X, Lockwood DJ, Tay L, Sproule GI
Journal of Vacuum Science & Technology B, 22(3), 1479, 2004
8 Studies of oxide desorption from GaAs substrates via Ga2O3 to Ga2O conversion by exposure to Ga flux
Wasilewski ZR, Baribeau JM, Beaulieu M, Wu X, Sproule GI
Journal of Vacuum Science & Technology B, 22(3), 1534, 2004
9 Anodic oxidation of gallium nitride
Pakes A, Skeldon P, Thompson GE, Fraser JW, Moisa S, Sproule GI, Graham MJ, Newcomb SB
Journal of Materials Science, 38(2), 343, 2003
10 Ultrathin zirconium silicate films deposited on Si(100) using Zr(O-i-Pr)(2)(thd)(2), Si(O-t-Bu)(2)(thd)(2), and nitric oxide
Chen HW, Huang TY, Landheer D, Wu X, Moisa S, Sproule GI, Kim JK, Lennard WN, Chao TS
Journal of the Electrochemical Society, 150(7), C465, 2003