| 1 |
Note on the artefacts in SRIM simulation of sputtering
Shulga VI
Applied Surface Science, 439, 456, 2018 |
| 2 |
On the target surface cleanness during magnetron sputtering
Schelfhout R, Strijckmans K, Boydens F, Depla D
Applied Surface Science, 355, 743, 2015 |
| 3 |
The influence of target surface morphology on the deposition flux during direct-current magnetron sputtering
Boydens F, Leroy WP, Persoons R, Depla D
Thin Solid Films, 531, 32, 2013 |
| 4 |
Effects of evolving surface morphology on yield during focused ion beam milling of carbon
Adams DP, Mayer TM, Vasile MJ, Archuleta K
Applied Surface Science, 252(6), 2432, 2006 |
| 5 |
Quantitative fundamental SIMS studies using O-18 implant standards
Williams P, Sobers RC, Franzreb K, Lorincik J
Applied Surface Science, 252(19), 6429, 2006 |
| 6 |
Fundamental studies of the cluster ion bombardment of water ice
Szakal C, Kozole J, Winograd N
Applied Surface Science, 252(19), 6526, 2006 |
| 7 |
Sputtering simulations of organic overlayers on metal substrates by monoatomic and clusters projectiles
Postawa Z
Applied Surface Science, 231-2, 22, 2004 |
| 8 |
Sputtering of ag under C60(+) and Ga+ projectile bombardment
Sun S, Szakal C, Smiley EJ, Postawa Z, Wucher A, Garrison BJ, Winograd N
Applied Surface Science, 231-2, 64, 2004 |
| 9 |
Impact of the Ge concentration on the Ge-ionisation probability and the matrix sputter yield for a, SiGe matrix under oxygen irradiation
Huyghebaert C, Conard T, Brijs B, Vandervorst W
Applied Surface Science, 231-2, 708, 2004 |
| 10 |
Transient sputter yields, build-up of the altered layer and Ge-segregation as a function of the O-2(+) ion-fluence in SiGe
Huyghebaert C, Brijs B, Janssens T, Vandervorst W
Applied Surface Science, 203, 56, 2003 |
