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| No. | Article |
|---|---|
| 1 |
Epitaxial growth of relaxed germanium layers by reduced pressure chemical vapour deposition on (110) and (111) silicon substrates Nguyen VH, Dobbie A, Myronov M, Norris DJ, Walther T, Leadley DR Thin Solid Films, 520(8), 3222, 2012 |