화학공학소재연구정보센터
검색결과 : 4건
No. Article
1 Space-charge effects in projection electron-beam lithography: Results from the SCALPEL proof-of-lithography system
Liddle JA, Blakey MI, Bolan K, Farrow RC, Gallatin GM, Kasica R, Katsap V, Knurek CS, Li J, Mkrtchyan M, Novembre AE, Ocola L, Orphanos PA, Peabody ML, Stanton ST, Teffeau K, Waskiewicz WK, Munro E
Journal of Vacuum Science & Technology B, 19(2), 476, 2001
2 Critical tool performance analysis for SCALPEL extensibility
Stanton ST, Liddle JA, Waskiewicz WK, Mkrtchyan MM
Journal of Vacuum Science & Technology B, 18(1), 112, 2000
3 Finite element analysis of SCALPEL wafer heating
Kim BY, Engelstad RL, Lovell EG, Stanton ST, Liddle JA, Gallatin GM
Journal of Vacuum Science & Technology B, 17(6), 2883, 1999
4 Critical dimension control at stitched subfield boundaries in a high-throughput SCALPEL((R)) system
Stanton ST, Liddle JA, Waskiewicz WK, Novembre AE
Journal of Vacuum Science & Technology B, 16(6), 3197, 1998