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| No. | Article |
|---|---|
| 1 |
Characterization and Correction of Optical Proximity Effects in Deep-Ultraviolet Lithography Using Behavior Modeling Yen A, Tritchkov A, Stirniman JP, Vandenberghe G, Jonckheere R, Ronse K, Vandenhove L Journal of Vacuum Science & Technology B, 14(6), 4175, 1996 |