검색결과 : 7건
| No. | Article |
|---|---|
| 1 |
Analysis of time-dependent haze on silicon surfaces Munter N, Kolbesen BO, Storm W, Muller T Journal of the Electrochemical Society, 150(3), G192, 2003 |
| 2 |
Controlled deposition of organic contamination and removal with ozone-based cleanings Claes M, De Gendt S, Kenens C, Conard T, Bender H, Storm W, Bauer T, Mertens P Journal of the Electrochemical Society, 148(3), G118, 2001 |
| 3 |
1,6-diene complexes of palladium(0) and platinum(0): Highly reactive sources for the naked metals and [L-M-0] fragments Krause J, Cestaric G, Haack KJ, Seevogel K, Storm W, Porschke KR Journal of the American Chemical Society, 121(42), 9807, 1999 |
| 4 |
Surface processes occurring on TiSi2 and CoSi2 in fluorine-based plasmas : Afterglow of a NF3 plasma Baklanov MR, Vanhaelemeersch S, Storm W, Vandervorst W, Maax K Journal of Vacuum Science & Technology B, 16(1), 164, 1998 |
| 5 |
Surface Processes Occurring on TiSi2 and CoSi2 in Fluorine-Based Plasmas - Reactive Ion Etching in CF4/Chf3 Plasmas Baklanov MR, Vanhaelemeersch S, Storm W, Kim YB, Vandervorst W, Maex K Journal of Vacuum Science & Technology A, 15(6), 3005, 1997 |
| 6 |
Kinetics and Mechanism of the Etching of CoSi2 in HF-Based Solutions Baklanov MR, Badmaeva IA, Donaton RA, Sveshnikova LL, Storm W, Maex K Journal of the Electrochemical Society, 143(10), 3245, 1996 |
| 7 |
Analysis of Stoichiometry and Oxide-Growth of HF Treated GaAs(100) by X-Ray Photoelectron-Spectroscopy and Time-of-Flight Secondary-Ion Mass-Spectrometry Storm W, Wolany D, Schroder F, Becker G, Burkhardt B, Wiedmann L Journal of Vacuum Science & Technology B, 12(1), 147, 1994 |