검색결과 : 6건
| No. | Article |
|---|---|
| 1 |
New method of fabricating silicon wafer for the photovoltaic application based on sintering and recrystallization steps Bellanger P, Sow A, Grau M, Augusto A, Serra JM, Kaminski A, Dubois S, Straboni A Journal of Crystal Growth, 359, 92, 2012 |
| 2 |
Photoelectrochemical characterization of p-type silicon electrodes covered with tunnelling nitride dielectric films Lana-Villarreal T, Straboni A, Pichon L, Alonso-Vante N Thin Solid Films, 515(18), 7376, 2007 |
| 3 |
In situ tensile tests in SEM of sputtered CNx films deposited on Ti6Al4V substrate: effect of film thickness and plasma surface pretreatment Villechaise P, Milhet X, Angleraud B, Fouquet V, Pichon L, Straboni A, Tessier R Thin Solid Films, 482(1-2), 324, 2005 |
| 4 |
Plasma assisted nitridation of Ti-6Al-4V Fouquet V, Pichon L, Drouet M, Straboni A Applied Surface Science, 221(1-4), 248, 2004 |
| 5 |
Evidence of omega-phase in ion beam sputtered zirconium thin films Pichon L, Girardeau T, Lignou F, Straboni A Thin Solid Films, 342(1-2), 93, 1999 |
| 6 |
Low-Energy (3-100 eV) Electron-Bombardment-Induced Nitridation of Thin SiO2-Films - Physicochemical and Electrical Analyses Glachant A, Garcia V, Balland B, Bureau JC, Plossu C, Dupuy JC, Straboni A Thin Solid Films, 238(1), 31, 1994 |