검색결과 : 5건
| No. | Article |
|---|---|
| 1 |
High-yield self-limiting single-nanowire assembly with dielectrophoresis Freer EM, Grachev O, Duan XF, Martin S, Stumbo DP Nature Nanotechnology, 5(7), 525, 2010 |
| 2 |
High-yield self-limiting single-nanowire assembly with dielectrophoresis (vol 5, pg 525, 2010) Freer EM, Grachev O, Duan XF, Martin S, Stumbo DP Nature Nanotechnology, 5(8), 625, 2010 |
| 3 |
Projection reduction exposure with variable axis immersion lenses: Next generation lithography Pfeiffer HC, Dhaliwal RS, Golladay SD, Doran SK, Gordon MS, Groves TR, Kendall RA, Lieberman JE, Petric PF, Pinckney DJ, Quickle RJ, Robinson CF, Rockrohr JD, Senesi JJ, Stickel W, Tressler EV, Tanimoto A, Yamaguchi T, Okamoto K, Suzuki K, Okino T, Kawata S, Morita K, Suziki SC, Shimizu H, Kojima S, Varnell G, Novak WT, Stumbo DP, Sogard M Journal of Vacuum Science & Technology B, 17(6), 2840, 1999 |
| 4 |
Contrast of Ion-Beam Proximity Printing with Nonideal Masks Stumbo DP, Wolfe JC Journal of Vacuum Science & Technology B, 12(6), 3539, 1994 |
| 5 |
Ion Exposure Characterization of a Chemically Amplified Epoxy Resist Stumbo DP, Wolfe JC Journal of Vacuum Science & Technology B, 11(6), 2432, 1993 |