화학공학소재연구정보센터
검색결과 : 2건
No. Article
1 Real-time reactive ion etch metrology techniques to enable in situ response surface process characterization
Klimecky P, Garvin C, Galarza CG, Stutzman BS, Khargonekar PP, Terry FL
Journal of the Electrochemical Society, 148(1), C34, 2001
2 Two-channel spectroscopic reflectometry for in situ monitoring of blanket and patterned structures during reactive ion etching
Stutzman BS, Huang HT, Terry FL
Journal of Vacuum Science & Technology B, 18(6), 2785, 2000