| 1 |
Plasma-Assisted ALD of Highly Conductive HfNx: On the Effect of Energetic Ions on Film Microstructure
Karwal S, Verheijen MA, Arts K, Faraz T, Kessels WMM, Creatore M
Plasma Chemistry and Plasma Processing, 40(3), 697, 2020 |
| 2 |
Effect of substrate bias and substrate/plasma generator distance on properties of a-C:H:SiOx films synthesized by PACVD
Grenadyorov AS, Solovyev AA, Oskomov KV, Rabotkin SV, Elgin YI, Sypchenko VS, Ivanova NM
Thin Solid Films, 669, 253, 2019 |
| 3 |
Effect of substrate bias voltage on tensile properties of single crystal silicon microstructure fully coated with plasma CVD diamond-like carbon film
Zhang WL, Hirai Y, Tsuchiya T, Tabata O
Applied Surface Science, 443, 48, 2018 |
| 4 |
Preparation of nickel-containing conductive amorphous carbon films by magnetron sputtering with negative high-voltage pulsed substrate bias
Solovyev AA, Oskomov KV, Grenadyorov AS, Maloney PD
Thin Solid Films, 650, 37, 2018 |
| 5 |
Investigations on the substrate bias influence on reactive HPPMS plasmas
Bobzin K, Brogelmann T, Kruppe NC, Engels M
Thin Solid Films, 663, 62, 2018 |
| 6 |
Effect of substrate bias on properties of HiPIMS deposited vanadium nitride films
Hajihoseini H, Kateb M, Ingvarsson S, Gudmundsson JT
Thin Solid Films, 663, 126, 2018 |
| 7 |
Variation of local chemical compositions of (Ti, Al)N films on inner wall of small hole deposited by high-power impulse magnetron sputtering
Komiya H, Shimizu T, Teranishi Y, Morikawa K, Yang M
Thin Solid Films, 644, 99, 2017 |
| 8 |
Experimental and modeling study on the role of Ar addition to the working gas on the development of intrinsic stress in TiN coatings produced by filtered vacuum-arc plasma
Vasyliev VV, Kalinichenko AI, Reshetnyak EN, Azar GTP, Urgen M, Strel'nitskij VE
Thin Solid Films, 642, 207, 2017 |
| 9 |
Effects of frequency of pulsed substrate bias on structure and properties of silicon-doped diamond-like carbon films by plasma deposition
Nakazawa H, Kamata R, Miura S, Okuno S
Thin Solid Films, 574, 93, 2015 |
| 10 |
The influence of deposition parameters on the structure and properties of aluminum nitride coatings deposited by high power impulse magnetron sputtering
Chang CT, Yang YC, Lee JW, Lou BS
Thin Solid Films, 572, 161, 2014 |
