검색결과 : 4건
| No. | Article |
|---|---|
| 1 |
Electrochemical investigation of the roles of oxyanions in chemical-mechanical planarization of tantalum and tantalum nitride Sulyma CM, Pettit CM, Surisetty CVVS, Babu SV, Roy D Journal of Applied Electrochemistry, 41(5), 561, 2011 |
| 2 |
Utility of Oxy-Anions for Selective Low Pressure Polishing of Cu and Ta in Chemical Mechanical Planarization Surisetty CVVS, Peethala BC, Roy D, Babu SV Electrochemical and Solid State Letters, 13(7), H244, 2010 |
| 3 |
Oxalic-acid-based slurries with tunable selectivity for copper and tantalum removal in CMP Janjam SVSB, Surisetty CVVS, Pandija S, Roy D, Babu SV Electrochemical and Solid State Letters, 11(3), H66, 2008 |
| 4 |
Dissolution Inhibition in Cu-CMP Using Dodecyl-Benzene-Sulfonic Acid Surfactant with Oxalic Acid and Glycine as Complexing Agents Surisetty CVVS, Goonetilleke PC, Roy D, Babu SV Journal of the Electrochemical Society, 155(12), H971, 2008 |