검색결과 : 47건
| No. | Article |
|---|---|
| 1 |
Titanium nitride films for micro-supercapacitors: Effect of surface chemistry and film morphology on the capacitance Achour A, Porto RL, Soussou MA, Islam M, Boujtita M, Aissa KA, Le Brizoual L, Djouadi A, Brousse T Journal of Power Sources, 300, 525, 2015 |
| 2 |
Influence of Sr+2 concentrations on growth of SrTiO3 thin films synthesized by hydrothermal-galvanic couple method Tsai YH, Chieh YC, Lu FH Thin Solid Films, 570, 479, 2014 |
| 3 |
The effect of electrochemical lithiation on physicochemical properties of RF-sputtered Sn thin films Nimisha CS, Venkatesh G, Munichandraiah N, Rao GM Journal of Applied Electrochemistry, 41(11), 1287, 2011 |
| 4 |
Development of texture in TiN films deposited by filtered cathodic vacuum arc Cheng YH, Tay BK Journal of Crystal Growth, 252(1-3), 257, 2003 |
| 5 |
The amorphous range in sputtered Si-Al-Sn films Hatchard TD, Dahn JR, Trussler S, Fleischauer M, Bonakdarpour A, Mueller-Neuhaus JR, Hewitt KC Thin Solid Films, 443(1-2), 144, 2003 |
| 6 |
Physical and morphological characterization of reactively magnetron sputtered TiN films Vaz F, Machado P, Rebouta L, Mendes JA, Lanceros-Mendez S, Cunha L, Nascimento SMC, Goudeau P, Riviere JP, Alves E, Sidor A Thin Solid Films, 420-421, 421, 2002 |
| 7 |
Microstructural evolution during tempering of arc-evaporated Cr-N coatings Almer J, Oden M, Hultman L, Hakansson G Journal of Vacuum Science & Technology A, 18(1), 121, 2000 |
| 8 |
Mechanical properties of titanium nitride coatings deposited by inductively coupled plasma assisted direct current magnetron sputtering Lim JW, Park HS, Park TH, Lee JJ, Joo J Journal of Vacuum Science & Technology A, 18(2), 524, 2000 |
| 9 |
Crystalline structure of very hard tungsten carbide thin films obtained by reactive pulsed laser deposition Mihailescu IN, Gyorgy E, Marin G, Popescu M, Teodorescu VS, Van Landuyt J, Grivas C, Hatziapostolou A Journal of Vacuum Science & Technology A, 17(1), 249, 1999 |
| 10 |
Graded TiAlN layers deposited by electron cyclotron resonance-assisted reactive sputtering Raveh A, Rosen DZ, Shneck R, Weiss M Journal of Vacuum Science & Technology A, 17(4), 2001, 1999 |