화학공학소재연구정보센터
검색결과 : 3건
No. Article
1 Mathematical Modeling for Chemical Vapor Deposition in a Single-Wafer Reactor: Application to Low-Pressure Deposition of Tungsten
Park JH
Korean Journal of Chemical Engineering, 19(3), 391, 2002
2 The Hydrogen Reduction of Wf6 - A Kinetic-Study Based on in-Situ Partial-Pressure Measurements
Oosterlaken TG, Leusink GJ, Janssen GC, Radelaar S
Journal of the Electrochemical Society, 143(5), 1668, 1996
3 Electron-Beam-Induced Etching of Resist with Water-Vapor as the Etching Medium
Kohlmannvonplaten KT, Bruenger WH
Journal of Vacuum Science & Technology B, 14(6), 4262, 1996