검색결과 : 1건
| No. | Article |
|---|---|
| 1 |
Influence of cathode material and SiCl4 gas on inductively coupled plasma etching of AlGaN layers with Cl-2/Ar plasma Zhirnov E, Stepanov S, Wang WN, Shreter YG, Takhin DV, Bochkareva NI Journal of Vacuum Science & Technology A, 22(6), 2336, 2004 |