| 1 |
High performance and toxicity assessment of Ta3N5 nanotubes for photoelectrochemical water splitting
Xu KQ, Chatzitakis A, Risbakk S, Yang MY, Backe PH, Grandcolas M, Bjoras M, Norby T
Catalysis Today, 361, 57, 2021 |
| 2 |
Enhancing photocatalytic activity of tantalum nitride by rational suppression of bulk, interface and surface charge recombination
Xiao M, Wang ZL, Luo B, Wang SC, Wang LZ
Applied Catalysis B: Environmental, 246, 195, 2019 |
| 3 |
Impact of silica-substrate chemistry on tantalum nitride thin films deposited by atomic layer deposition: Microstructure, chemistry and electrical behaviors
Volpi F, Cadix L, Berthome G, Coindeau S, Encinas T, Jourdan N, Blanquet E
Thin Solid Films, 669, 392, 2019 |
| 4 |
Low temperature thermal ALD TaNx and TiNx films from anhydrous N2H4
Wolf S, Breeden M, Kwak I, Park JH, Kavrik M, Naik M, Alvarez D, Spiegelman J, Kummel AC
Applied Surface Science, 462, 1029, 2018 |
| 5 |
Polylaminate TaN/Ta coating modified ferritic stainless steel bipolar plate for high temperature proton exchange membrane fuel cell
Wang LX, Li L, Liu HY, Wang SW, Fang H, Gao HL, Gao KZ, Zhang Y, Sun JC, Yan J
Journal of Power Sources, 399, 343, 2018 |
| 6 |
Influence of backscattered neutrals on the grain size of magnetron-sputtered TaN thin films
Rudolph M, Lundin D, Foy E, Debongnie M, Hugon MC, Minea T
Thin Solid Films, 658, 46, 2018 |
| 7 |
Reliability and characteristics of magnetron sputter deposited tantalum nitride for thin film resistors
Lee DW, Kim YN, Cho MY, Ko PJ, Lee D, Koo SM, Moon KS, Oh JM
Thin Solid Films, 660, 688, 2018 |
| 8 |
Nitrogen transfer properties in tantalum nitride based material
Laassiri S, Zeinalipour-Yazdi CD, Catlow CRA, Hargreaves JSJ
Catalysis Today, 286, 147, 2017 |
| 9 |
TaNx coatings deposited by HPPMS on SS316L bipolar plates for polymer electrolyte membrane fuel cells: Correlation between corrosion current, contact resistance and barrier oxide film formation
Mendizabal L, Oedegaard A, Kongstein OE, Leedre S, Walmsley J, Barriga J, Gonzalez JJ
International Journal of Hydrogen Energy, 42(5), 3259, 2017 |
| 10 |
Growth of tantalum nitride film as a Cu diffusion barrier by plasma-enhanced atomic layer deposition from bis((2-(dimethylamino)ethyl)(methyl)amido)methyl(tert-butylimido) tantalum complex
Han JH, Kim HY, Lee SC, Kim DH, Park BK, Park JS, Jeon DJ, Chung TM, Kim CG
Applied Surface Science, 362, 176, 2016 |
