검색결과 : 4건
No. | Article |
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1 |
High density plasma reactive ion etching of CoFeB magnetic thin films using a CH4/Ar plasma Kim EH, Lee TY, Min BC, Chung CW Thin Solid Films, 521, 216, 2012 |
2 |
Evolution of etch profile in etching of CoFeB thin films using high density plasma reactive ion etching Bin Xiao Y, Kim EH, Kong SM, Chung CW Thin Solid Films, 519(20), 6673, 2011 |
3 |
Investigation on etch characteristics of MgO thin films using a HBr/Ar plasma Kim EH, Bin Xiao Y, Kong SM, Chung CW Thin Solid Films, 519(20), 6820, 2011 |
4 |
Etch characteristics of IrMn thin films using an inductively coupled plasma of CH3OH/Ar Bin Xiao Y, Kim EH, Kong SM, Chung CW Thin Solid Films, 519(23), 8229, 2011 |