화학공학소재연구정보센터
검색결과 : 4건
No. Article
1 High density plasma reactive ion etching of CoFeB magnetic thin films using a CH4/Ar plasma
Kim EH, Lee TY, Min BC, Chung CW
Thin Solid Films, 521, 216, 2012
2 Evolution of etch profile in etching of CoFeB thin films using high density plasma reactive ion etching
Bin Xiao Y, Kim EH, Kong SM, Chung CW
Thin Solid Films, 519(20), 6673, 2011
3 Investigation on etch characteristics of MgO thin films using a HBr/Ar plasma
Kim EH, Bin Xiao Y, Kong SM, Chung CW
Thin Solid Films, 519(20), 6820, 2011
4 Etch characteristics of IrMn thin films using an inductively coupled plasma of CH3OH/Ar
Bin Xiao Y, Kim EH, Kong SM, Chung CW
Thin Solid Films, 519(23), 8229, 2011