검색결과 : 4건
| No. | Article |
|---|---|
| 1 |
Linewidth reduction using liquid ashing for sub-100 nm critical dimensions with 248 nm lithography Timko AG, Frackoviak J, Hopkins LC, Klemens FP, Trimble LE, Nalamasu O, Watson GP, Mansfield WM, Barr D, Li J Journal of Vacuum Science & Technology B, 19(6), 2713, 2001 |
| 2 |
Environmental stability of 193 nm single layer chemically amplified resists Timko AG, Houlihan FM, Cirelli RA, Nalamasu O, Yoshino H, Itani T, Tanabe H, Kasama K Journal of Vacuum Science & Technology B, 17(1), 101, 1999 |
| 3 |
193 nm single layer resist strategies, concepts, and recent results Nalamasu O, Houlihan FM, Cirelli RA, Timko AG, Watson GP, Hutton RS, Kometani JM, Reichmanis E, Gabor A, Medina A, Slater S Journal of Vacuum Science & Technology B, 16(6), 3716, 1998 |
| 4 |
Resist design concepts for 193 nm lithography : Opportunities for innovation and invention Reichmanis E, Nalamasu O, Houlihan FM, Wallow TI, Timko AG, Cirelli R, Dabbagh G, Hutton RS, Novembre AE, Smith BW Journal of Vacuum Science & Technology B, 15(6), 2528, 1997 |