검색결과 : 4건
| No. | Article |
|---|---|
| 1 |
Study of plasma charging-induced white pixel defect increase in CMOS active pixel sensor Tokashiki K, Bai K, Baek K, Kim Y, Min G, Kang C, Cho H, Moon J Thin Solid Films, 515(12), 4864, 2007 |
| 2 |
Optical-Emission Diagnostics for Contact Etching in Applied Materials Centura Hdp 5300 Etcher Guinn K, Tokashiki K, Mcnevin SC, Cerullo N Journal of Vacuum Science & Technology A, 14(3), 1137, 1996 |
| 3 |
Reactive Ion Etching of Silicon Oxynitride Formed by Plasma-Enhanced Chemical-Vapor-Deposition Ueno K, Kikkawa T, Tokashiki K Journal of Vacuum Science & Technology B, 13(4), 1447, 1995 |
| 4 |
Multilayer Resist Dry-Etching Technology for Deep-Submicron Lithography Tokashiki K, Sato K, Aoto N, Ikawa E Journal of Vacuum Science & Technology B, 11(6), 2284, 1993 |