| 1 |
Determination of the input parameters for inelastic background analysis combined with HAXPES using a reference sample
Zborowski C, Renault O, Torres A, Yamashita Y, Grenet G, Tougaard S
Applied Surface Science, 432, 60, 2018 |
| 2 |
Effective inelastic scattering cross-sections for background analysis in HAXPES of deeply buried layers
Risterucci P, Renault O, Zborowski C, Bertrand D, Torres A, Rueff JP, Ceolin D, Grenet G, Tougaard S
Applied Surface Science, 402, 78, 2017 |
| 3 |
Determination of electronic properties of nanostructures using reflection electron energy loss spectroscopy: Nano-metalized polymer as case study
Deris J, Hajati S, Tougaard S, Zaporojtchenko V
Applied Surface Science, 377, 44, 2016 |
| 4 |
Quantitative analysis of satellite structures in XPS spectra of gold and silver
Pauly N, Yubero F, Tougaard S
Applied Surface Science, 383, 317, 2016 |
| 5 |
Composition dependence of dielectric and optical properties of Hf-Zr-silicate thin films grown, on Si(100) by atomic layer deposition
Tahir D, Oh SK, Kang HJ, Tougaard S
Thin Solid Films, 616, 425, 2016 |
| 6 |
Effects of cation compositions on the electronic properties and optical dispersion of indium zinc tin oxide thin films by electron spectroscopy
Denny YR, Seo S, Lee K, Oh SK, Kang HJ, Heo S, Chung JG, Lee JC, Tougaard S
Materials Research Bulletin, 62, 222, 2015 |
| 7 |
First nucleation steps of nickel nanoparticle growth on Al2O3 (0001) studied by XPS inelastic peak shape analysis
Gallardo-Vega C, De La Cruz W, Tougaard S, Cota-Araiza L
Applied Surface Science, 255(5), 3000, 2008 |
| 8 |
Penetration of fluorine into the silicon lattice during exposure to F atoms, F-2, and XeF2: Implications for spontaneous etching reactions
Winters HF, Graves DB, Humbird D, Tougaard S
Journal of Vacuum Science & Technology A, 25(1), 96, 2007 |
| 9 |
Algorithm for automatic x-ray photoelectron spectroscopy data processing and x-ray photoelectron spectroscopy imaging
Tougaard S
Journal of Vacuum Science & Technology A, 23(4), 741, 2005 |
| 10 |
Quantitative x-ray photoelectron spectroscopy: Simple algorithm to determine the amount of atoms in the outermost few nanometers
Tougaard S
Journal of Vacuum Science & Technology A, 21(4), 1081, 2003 |
