검색결과 : 6건
| No. | Article |
|---|---|
| 1 |
Extreme expansion of proximity gap by double exposures using enlarged pattern masks for line and space pattern formation in x-ray lithography (evolution of exposure method to symmetric illumination) Toyota E, Washio M, Watanabe H, Sumitani H Journal of Vacuum Science & Technology B, 21(6), 2821, 2003 |
| 2 |
Extendibility of proximity x-ray lithography to 25 nm and below Toyota E, Washio M Journal of Vacuum Science & Technology B, 20(6), 2979, 2002 |
| 3 |
Technique for 25 nm x-ray nanolithography Toyota E, Hori T, Khan M, Cerrina F Journal of Vacuum Science & Technology B, 19(6), 2428, 2001 |
| 4 |
Performance of a compact beamline with high brightness for x-ray lithography Hirose S, Miyatake T, Li X, Toyota E, Hirose M, Fujii K, Suzuki K Journal of Vacuum Science & Technology B, 18(6), 2986, 2000 |
| 5 |
Pattern resolution of an x-ray beamline with a wide exposure field Khan M, Cerrina F, Toyota E Journal of Vacuum Science & Technology B, 17(6), 3433, 1999 |
| 6 |
Design study of compact beam lines for x-ray lithography Toyota E Journal of Vacuum Science & Technology B, 16(6), 3462, 1998 |