검색결과 : 12건
| No. | Article |
|---|---|
| 1 |
Carbon coated MFe2O4 (M=Fe, Co, Ni) magnetite nanoparticles: A smart adsorbent for direct yellow and moderacid red dyes Tran HV, Nguyen HV, Vu DV, Le TD, Nguyen BT, Le DH Korean Journal of Chemical Engineering, 39(2), 431, 2022 |
| 2 |
Non-woven polyester fabric-supported cuprous oxide/reduced graphene oxide nanocomposite for photocatalytic degradation of methylene blue Dao MU, Nguyen TTT, Le VT, Hoang HY, Le TTN, Pham TN, Nguyen TT, Akhmadullin RM, Le HS, Tran HV, Tran DL Journal of Materials Science, 56(17), 10353, 2021 |
| 3 |
On the predictions for diffusion-driven evaporation of sessile droplets with interface cooling Tran HV, Nguyen TAH, Biggs SR, Nguyen AV Chemical Engineering Science, 177, 417, 2018 |
| 4 |
Dissecting Porosity in Molecular Crystals: Influence of Geometry, Hydrogen Bonding, and [pi center dot center dot center dot pi] Stacking on the Solid-State Packing of Fluorinated Aromatics Hashim MI, Le HTM, Chen TH, Chen YS, Daugulis O, Hsu CW, Jacobson AJ, Kaveevivitchai W, Liang X, Makarenko T, Miljanic OS, Popovs I, Tran HV, Wang XQ, Wu CH, Wu JI Journal of the American Chemical Society, 140(18), 6014, 2018 |
| 5 |
Bis(fluoroalcohol) monomers and polymers: Improved transparency fluoropolymer photoresists for semiconductor photolithography at 1.57 nm Feiring AE, Crawford MK, Farnham WB, French RH, Leffew KW, Petrov VA, Schadt FL, Tran HV, Zumsteg FC Macromolecules, 39(4), 1443, 2006 |
| 6 |
New amorphous fluoropolymers of tetrafluoroethylene with fluorinated and non-fluorinated tricyclononenes. Semiconductor photoresists for imaging at 157 and 193 nm Feiring AE, Crawford MK, Farnham WB, Feldman J, French RH, Junk CP, Leffew KW, Petrov VA, Qiu WM, Schadt FL, Tran HV, Zumsteg FC Macromolecules, 39(9), 3252, 2006 |
| 7 |
Recent advances in resists for 157 nm microlithography Trinque BC, Chiba T, Hung RJ, Chambers CR, Pinnow MJ, Osburn BP, Tran HV, Wunderlich J, Hsieh YT, Thomas BH, Shafer G, DesMarteau DD, Conley W, Willson CG Journal of Vacuum Science & Technology B, 20(2), 531, 2002 |
| 8 |
Acid catalyst mobility in resist resins Stewart MD, Tran HV, Schmid GM, Stachowiak TB, Becker DJ, Willson CG Journal of Vacuum Science & Technology B, 20(6), 2946, 2002 |
| 9 |
Metal-catalyzed vinyl addition polymers for 157 nm resist applications. 2. Fluorinated norbornenes: Synthesis, polymerization, and initial imaging results Tran HV, Hung RJ, Chiba T, Yamada S, Mrozek T, Hsieh YT, Chambers CR, Osborn BP, Trinque BC, Pinnow MJ, MacDonald SA, Willson CG, Sanders DP, Connor EF, Grubbs RH, Conley W Macromolecules, 35(17), 6539, 2002 |
| 10 |
157 nm resist materials: Progress report Brodsky C, Byers J, Conley W, Hung R, Yamada S, Patterson K, Somervell M, Trinque B, Tran HV, Cho S, Chiba T, Lin SH, Jamieson A, Johnson H, Vander Heyden T, Willson CG Journal of Vacuum Science & Technology B, 18(6), 3396, 2000 |