검색결과 : 7건
| No. | Article |
|---|---|
| 1 |
Hydrogen bond mediated partially miscible poly(N-acryloyl piperidine)/poly(acrylic acid) blend with one glass transition temperature Wang XW, Yang YF, Zhou YY, Wu PY, Chen HY, Trefonas P Polymer, 151, 269, 2018 |
| 2 |
OPTOELECTRONICS Double-heterojunction nanorod light-responsive LEDs for display applications Oh NR, Kim BH, Cho SY, Nam S, Rogers SP, Jiang YR, Flanagan JC, Zhai Y, Kim JH, Lee JY, Yu YJ, Cho YK, Hur G, Zhang JQ, Trefonas P, Rogers JA, Shim M Science, 355(6325), 616, 2017 |
| 3 |
Advanced Photoresist Technologies by Intricate Molecular Brush Architectures: Diblock Brush Terpolymer-Based Positive-Tone Photoresist Materials Sun GR, Cho SH, Yang F, He X, Pavia-Sanders A, Clark C, Raymond JE, Verkhoturov SV, Schweikert EA, Thackeray JW, Trefonas P, Wooley KL Journal of Polymer Science Part A: Polymer Chemistry, 53(2), 193, 2015 |
| 4 |
Computational Modeling of Block-Copolymer Directed Self-Assembly Ginzburg VV, Weinhold JD, Trefonas P Journal of Polymer Science Part B: Polymer Physics, 53(2), 90, 2015 |
| 5 |
Directing Self-Assembly of Nanoscopic Cylindrical Diblock Brush Terpolymers into Films with Desired Spatial Orientations: Expansion of Chemical Composition Scope Cho SH, Yang F, Sun GR, Eller MJ, Clark C, Schweikert EA, Thackeray JW, Trefonas P, Wooley KL Macromolecular Rapid Communications, 35(4), 437, 2014 |
| 6 |
Nanoscopic Cylindrical Dual Concentric and Lengthwise Block Brush Terpolymers as Covalent Preassembled High-Resolution and High-Sensitivity Negative-Tone Photoresist Materials Sun GR, Cho SH, Clark C, Verkhoturov SV, Eller MJ, Li A, Pavia-Jimenez A, Schweikert EA, Thackeray JW, Trefonas P, Wooley KL Journal of the American Chemical Society, 135(11), 4203, 2013 |
| 7 |
Resist effects at small pitches Van Steenwinckel D, Lammers JH, Koehler T, Brainard RL, Trefonas P Journal of Vacuum Science & Technology B, 24(1), 316, 2006 |