검색결과 : 2건
| No. | Article |
|---|---|
| 1 |
Pulsed and continuous wave plasma deposition of amorphous, hydrogenated silicon carbide from SiH4/CH4 plasmas McCurdy PR, Truitt JM, Fisher ER Journal of Vacuum Science & Technology A, 17(5), 2475, 1999 |
| 2 |
Comparison of oxidation rates for a-Si1-xCx : H films deposited from pulsed and continuous wave RF plasmas McCurdy PR, Truitt JM, Fisher ER Journal of the Electrochemical Society, 145(9), 3271, 1998 |