1 |
Characterization of amorphous hydrogenated carbon formed by low-pressure inductively coupled plasma enhanced chemical vapor deposition using multiple low-inductance antenna units Tsuda O, Ishihara M, Koga Y, Fujiwara S, Setsuhara Y, Sato N Journal of Physical Chemistry B, 109(11), 4917, 2005 |
2 |
Microstructure and nanomechanical properties of cubic boron nitride films prepared by bias sputter deposition Yamada Y, Tsuda O, Yoshida T Thin Solid Films, 316(1-2), 35, 1998 |
3 |
Mass and Energy Measurements of the Species Responsible for CBN Growth in RF Bias Sputter Conditions Tsuda O, Tatebayashi Y, Yamadatakamura Y, Yoshida T Journal of Vacuum Science & Technology A, 15(6), 2859, 1997 |
4 |
Growth-Process of Cubic Boron-Nitride Films in Bias Sputter-Deposition Yamada Y, Tatebayashi Y, Tsuda O, Yoshida T Thin Solid Films, 295(1-2), 137, 1997 |
5 |
Preparation of Cubic Boron-Nitride Films by Radio-Frequency Bias Sputtering Tsuda O, Yamada Y, Fujii T, Yoshida T Journal of Vacuum Science & Technology A, 13(6), 2843, 1995 |