화학공학소재연구정보센터
검색결과 : 3건
No. Article
1 Resistive switching characteristics of multilayered (HfO2/Al2O3)(n) n=19 thin film
Tzeng WH, Zhong CW, Liu KC, Chang KM, Lin HC, Chan YC, Kuo CC, Tsai FY, Tseng MH, Chen PS, Lee HY, Chen F, Tsai MJ
Thin Solid Films, 520(8), 3415, 2012
2 Investigation of the effect of different oxygen partial pressure to LaAlO3 thin film properties and resistive switching characteristics
Liu KC, Tzeng WH, Chang KM, Huang JJ, Lee YJ, Yeh PH, Chen PS, Lee HY, Chen F, Tsai MJ
Thin Solid Films, 520(4), 1246, 2011
3 Effect of ultraviolet light exposure on a HfOx RRAM device
Liu KC, Tzeng WH, Chang KM, Chan YC, Kuo CC
Thin Solid Films, 518(24), 7460, 2010