화학공학소재연구정보센터
검색결과 : 3건
No. Article
1 Cu filling into trenches with Co (00.2) layer by using high-vacuum magnetron sputtering in N-2-addded Ar gas
Itoh M, Iida H, Uhara Y, Saito S
Applied Surface Science, 354, 124, 2015
2 Copper filling of deep sub-mu m through-holes by high-vacuum planar magnetron sputtering using argon gas with added oxygen
Uhara Y, Urano T, Itoh M, Hayashi H, Manba Y, Taniseki A, Jyan H, Nishikawa E, Saito S
Applied Surface Science, 256(4), 1240, 2009
3 Temperature dependence of the work function of Bi2Sr2CaCu2O8 single crystal cleaved at low temperature
Saito S, Sutou T, Norimitsu Y, Yajima N, Uhara Y, Uenosono T, Soumura T, Tani T
Applied Surface Science, 252(2), 379, 2005