화학공학소재연구정보센터
검색결과 : 2건
No. Article
1 CH4/H-2/Ar Electron-Cyclotron-Resonance Plasma-Etching for GaAs-Based Field-Effect Transistors
Vanhassel JG, Vanes CM, Nouwens PA, Maahury JH, Kaufmann LM
Journal of the Electrochemical Society, 142(8), 2849, 1995
2 Influence of in-Situ Argon Cleaning of GaAs on Schottky Diodes and Metal-Semiconductor Field-Effect Transistors
Vanhassel JG, Heyker HC, Kwaspen JJ
Journal of Vacuum Science & Technology B, 13(6), 2245, 1995